Direct pattern transfer for sub-45 nm features using nanoimprint lithography

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 839-842

  Le, Ngoc V ^a   Dauksher, William J ^a   Gehoski, Kathy A ^a   Nordquist, Kevin J ^a   Ainley, Eric ^a   Mangat, Pawitter ^a  

^a MOTOROLA INC   (United States)

Author keywords

Etch; Nanoimprint lithography; S FIL

Indexed keywords

DISPENSERS; ETCHING; OPTICAL RESOLVING POWER; PATTERN RECOGNITION; RESIDUAL STRESSES;

ETCH; RESIDUAL LAYER; RESOLUTION PATTERN; S-FIL;

NANOTECHNOLOGY;

EID: 33646049710     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.254     Document Type: Article

References (8)

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