Chemically enhanced focused ion beam micromachining of copper

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2539-2542

  Gonzalez, J C ^a   Griffis, D P ^a   Miau, T T ^b   Russell, P E ^a  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

^b SCHLUMBERGER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHLORINE COMPOUNDS; COPPER; CRYSTALLOGRAPHY; DIELECTRIC MATERIALS; ETHANOL; METHANOL; MICROMACHINING; MILLING (MACHINING); VAPORS;

CRYSTALLOGRAPHIC CHANNELING EFFECT; END POINT DETECTION; FOCUSED ION BEAM MICROMACHINING;

ION BEAM LITHOGRAPHY;

EID: 0035519772     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1418406     Document Type: Article

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