Optimization and experimentation of nanoimprint lithography based on FIB fabricated stamp

Microelectronic Engineering

Volumn 82, Issue 2, 2005, Pages 175-179

  Sun, Hong Wen ^a   Liu, Jing Quan ^a   Chen, Di ^a   Gu, Pan ^a  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

Author keywords

Focused ion beam; Nanoimprint lithography; Orthogonal experiment; Parameter optimization; Taguchi method

Indexed keywords

ELECTRON BEAMS; ETCHING; ION BEAMS; MASKS; NANOTECHNOLOGY; OPTIMIZATION; POLYMERS;

FOCUSED ION BEAMS (FIB); NANOIMPRINT LITHOGRAPHY; ORTHOGONAL EXPERIMENTS; PARAMETER OPTIMIZATION; TAGUCHI METHODS;

LITHOGRAPHY;

EID: 25444478109     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2005.07.008     Document Type: Article

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