Fabrication of three-dimensional microstructures by two-dimensional slice by slice approaching via focused ion beam milling

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 4, 2004, Pages 1672-1678

  Fu, Yongqi ^a   Bryan, Ngoi Kok Ann ^b  

^a SINGAPORE MIT ALLIANCE   (Singapore)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

DWELL TIME; FOCUSED ION BEAMS (FIB); ION BEAM MILLING; PIXELS;

ASPECT RATIO; CODES (SYMBOLS); COMMINUTION; DATA STORAGE EQUIPMENT; FABRICATION; ION BEAMS; MATHEMATICAL MODELS; MICROLENSES; MICROSTRUCTURE; SCANNING ELECTRON MICROSCOPY;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 4944267478     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1761460     Document Type: Article

References (9)

1. M. J. Vasile, J. Xie, and R. Nassar, J. Vac. Sci. Technol. B 17, 3085 (1999).
2. R. Nassar, M. Vasile, and W. Zhang, J. Vac. Sci. Technol. B 16, 109 (1998).
3. M. J. Vasile, R. Nassar, and J. Xie, J. Vac. Sci. Technol. B 16, 2499 (1998).
4. N. Matsunami, Y. Yamamura, Y. Itakawa, N. Itoh, Y. Kazumata, S. Miyagawa, K. Morita, and R. Shimizu, Energy Dependence of Sputtering Yields of Monatomic Solids (Institute of Plasma Physics, Naagoya University, Nagoya, Japan, 1980), IPPJ-AM-14.
5. P. Sigmund and J. B. Sanders, in Proceedings of the International Conference on Application of Ion Beams to Semiconductor Technology, edited by P. Glotin (Editions Ophrys, Paris, 1967), p. 125.
6. A commonly used software for simulation and analysis of ion beam processing. It can be found in the website with the address: http://www.srim.org/srim/srimlegl.htm.
7. Jon Orlof, Handbook of CHARGED PARTICLE OPTICS (CRC, Boca Raton, PL, 1997), p. 433.
8. Y. Fu, N. Kok, and A. Bryan, Int. J. Advanced Manufacturing Technol. 16, 600 (2000).
9. Y. Fu, N. Kok, and A. Bryan, Opt. Eng. (Lett.) 40, 1433 (2000).