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Volumn 56, Issue 6, 2009, Pages 1243-1251

Multi-Channel Field-Effect Transistor (MCFET) - Part I: Electrical performance and current gain analysis

Author keywords

3 D; Current gain; ION IOFF; Mobility; Model; Multichannel field effect transistors (MCFETs); Simulations

Indexed keywords

3-D; CURRENT GAIN; ION/IOFF; MOBILITY; MULTICHANNEL FIELD-EFFECT TRANSISTORS (MCFETS); SIMULATIONS;

EID: 66949172861     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2009.2019700     Document Type: Article
Times cited : (24)

References (32)
  • 6
    • 46049086980 scopus 로고    scopus 로고
    • 2/TiN gate stack, in IEDM Tech. Dig., 2006, pp. 997-1000.
    • 2/TiN gate stack," in IEDM Tech. Dig., 2006, pp. 997-1000.
  • 12
    • 66949114030 scopus 로고    scopus 로고
    • A. Pouydebasque, S. Denorme, P. Coronel, N. Loubet, R. Wacquez, J. Bustos, F. Leverd, P. Gouraud, J.-D. Chapon, M. Dartora, X. Gérard, G. Chabanne, T. Kormann, M. Grosjean, E. Deloffre, N. Emonet, P. Morin, A. Zauner, S. Barnola, M. Aminpur, C. Laviron, S. Gaillard, D. Fleury, A. Cros, D. Delille, D. Dutartre, F. Boeuf, and T. Skotnicki, High performance high-K/metal planar self-aligned Gate-All-Around CMOS devices for 32 nm technologies and beyond, in Proc. Silicon Nano-Workshop, 2007, pp. 3-4.
    • A. Pouydebasque, S. Denorme, P. Coronel, N. Loubet, R. Wacquez, J. Bustos, F. Leverd, P. Gouraud, J.-D. Chapon, M. Dartora, X. Gérard, G. Chabanne, T. Kormann, M. Grosjean, E. Deloffre, N. Emonet, P. Morin, A. Zauner, S. Barnola, M. Aminpur, C. Laviron, S. Gaillard, D. Fleury, A. Cros, D. Delille, D. Dutartre, F. Boeuf, and T. Skotnicki, "High performance high-K/metal planar self-aligned Gate-All-Around CMOS devices for 32 nm technologies and beyond," in Proc. Silicon Nano-Workshop, 2007, pp. 3-4.
  • 14
    • 0003081256 scopus 로고
    • Evolution of surface morphology and strain during SiGe epitaxy
    • Dec
    • A. J. Pidduck, D. J. Robbins, A. G. Cullis, W. Y. Leong, and A. M. Pitt, "Evolution of surface morphology and strain during SiGe epitaxy," Thin Solid Films, vol. 222, no. 1/2, pp. 78-84, Dec. 1992.
    • (1992) Thin Solid Films , vol.222 , Issue.1-2 , pp. 78-84
    • Pidduck, A.J.1    Robbins, D.J.2    Cullis, A.G.3    Leong, W.Y.4    Pitt, A.M.5
  • 15
    • 24144500757 scopus 로고    scopus 로고
    • Growth of SiGe/Si superlattices on silicon-on-insulator substrates for multi-bridge channel field effect transistors
    • Sep
    • J. M. Hartmann, P. Holliger, F. Laugier, G. Rolland, A. Suhm, T. Ernst, T. Billon, and N. Vulliet, "Growth of SiGe/Si superlattices on silicon-on-insulator substrates for multi-bridge channel field effect transistors," J. Cryst. Growth, vol. 283, no. 1/2, pp. 57-67, Sep. 2005.
    • (2005) J. Cryst. Growth , vol.283 , Issue.1-2 , pp. 57-67
    • Hartmann, J.M.1    Holliger, P.2    Laugier, F.3    Rolland, G.4    Suhm, A.5    Ernst, T.6    Billon, T.7    Vulliet, N.8
  • 17
    • 66949139758 scopus 로고    scopus 로고
    • Multichannel Field-Effect Transistors (MCFET) - Part II: Analysis of gate stack and series resistance influence on the MCFET performance
    • Jun
    • E. Bernard, T. Ernst, B. Guillaumot, N. Vulliet, X. Garros, P. Coronel, T. Skotnicki, S. Deleonibus, and O. Faynot, "Multichannel Field-Effect Transistors (MCFET) - Part II: Analysis of gate stack and series resistance influence on the MCFET performance," IEEE Trans. Electron Devices, vol. 56, no. 6, pp. 1252-1261, Jun. 2009.
    • (2009) IEEE Trans. Electron Devices , vol.56 , Issue.6 , pp. 1252-1261
    • Bernard, E.1    Ernst, T.2    Guillaumot, B.3    Vulliet, N.4    Garros, X.5    Coronel, P.6    Skotnicki, T.7    Deleonibus, S.8    Faynot, O.9
  • 18
    • 17344374600 scopus 로고    scopus 로고
    • Isotropic etching of SiGe alloys with high selectivity to similar materials
    • Jun
    • S. Borel, C. Arvet, J. Bilde, S. Harrison, and D. Louis, "Isotropic etching of SiGe alloys with high selectivity to similar materials," Microelectron. Eng., vol. 73/74, pp. 301-305, Jun. 2004.
    • (2004) Microelectron. Eng , vol.73-74 , pp. 301-305
    • Borel, S.1    Arvet, C.2    Bilde, J.3    Harrison, S.4    Louis, D.5
  • 20
    • 46049113111 scopus 로고    scopus 로고
    • 2 as a metal gate stack for FDSOI cMOSFETs down to 25 nm gate length and width, in IEDM Tech. Dig., 2006, pp. 641-644.
    • 2 as a metal gate stack for FDSOI cMOSFETs down to 25 nm gate length and width," in IEDM Tech. Dig., 2006, pp. 641-644.
  • 21
    • 0031078092 scopus 로고    scopus 로고
    • A physical and scalable I-V model in BSIM3v3 for analog/digital circuit simulation
    • Feb
    • Y. Cheng, M. C. Jeng, Z. Liu, J. Huang, M. Chan, K. Chen, P. K. Ko, and C. Hu, "A physical and scalable I-V model in BSIM3v3 for analog/digital circuit simulation," IEEE Trans. Electron Devices, vol. 44, no. 2, pp. 277-287, Feb. 1997.
    • (1997) IEEE Trans. Electron Devices , vol.44 , Issue.2 , pp. 277-287
    • Cheng, Y.1    Jeng, M.C.2    Liu, Z.3    Huang, J.4    Chan, M.5    Chen, K.6    Ko, P.K.7    Hu, C.8
  • 23
    • 3943106832 scopus 로고    scopus 로고
    • Improved split C-V method for effective mobility extraction in sub-0.1 μm Si MOSFETs
    • Aug
    • K. Romanjek, F. Andrieu, T. Ernst, and G. Ghibaudo, "Improved split C-V method for effective mobility extraction in sub-0.1 μm Si MOSFETs," IEEE Electron Device Lett., vol. 25, no. 8, pp. 583-585, Aug. 2004.
    • (2004) IEEE Electron Device Lett , vol.25 , Issue.8 , pp. 583-585
    • Romanjek, K.1    Andrieu, F.2    Ernst, T.3    Ghibaudo, G.4
  • 24
    • 0023998758 scopus 로고
    • New method for the extraction of MOSFETs parameters
    • Apr
    • G. Ghibaudo, "New method for the extraction of MOSFETs parameters," Electron. Lett., vol. 24, no. 9, pp. 543-545, Apr. 1988.
    • (1988) Electron. Lett , vol.24 , Issue.9 , pp. 543-545
    • Ghibaudo, G.1
  • 32
    • 3042721855 scopus 로고    scopus 로고
    • A novel multibridge-channelMOSFET (MBCFET): Fabrication technologies and characteristics
    • Dec
    • S.-Y. Lee, S.-M. Kim, E.-J. Yoon, C.-W. Oh, I. Chung, D. Park, and K. Kim, "A novel multibridge-channelMOSFET (MBCFET): Fabrication technologies and characteristics," IEEE Trans. Nanotechnol., vol. 2, no. 4, pp. 253-257, Dec. 2003.
    • (2003) IEEE Trans. Nanotechnol , vol.2 , Issue.4 , pp. 253-257
    • Lee, S.-Y.1    Kim, S.-M.2    Yoon, E.-J.3    Oh, C.-W.4    Chung, I.5    Park, D.6    Kim, K.7


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.