Photoreactive chemisorbed monolayer suppressing polymer dewetting in thermal nanoimprint lithography

Langmuir

Volumn 25, Issue 12, 2009, Pages 6604-6606

  Oda, Hirokazu ^a,b   Ohtake, Tomoyuki ^c   Takaoka, Toshiaki ^c   Nakagawa, Masaru ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^c NOF Corporation   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DE-WETTING; GOLD SURFACES; GOLD THIN FILMS; GRAFT REACTIONS; RESIST LAYERS; SCALE PATTERN; THERMAL NANOIMPRINT LITHOGRAPHY; THERMALLY INDUCED; ULTRA-VIOLET LIGHT;

CHEMISORPTION; GOLD; GRAFTING (CHEMICAL); MONOLAYERS; SEMICONDUCTING SILICON; STYRENE; THIN FILM DEVICES; THIN FILMS; ULTRAVIOLET RADIATION; WET ETCHING;

NANOIMPRINT LITHOGRAPHY;

EID: 66749118335     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la900902f     Document Type: Article

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