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Volumn 20, Issue 4, 2007, Pages 549-554

UV nanoimprint lithography and its application for nanodevices

Author keywords

Electrodeposition; LED; Magnetic dot array; UV nanoimprint

Indexed keywords


EID: 37549016064     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.20.549     Document Type: Article
Times cited : (12)

References (10)
  • 1
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    • Imprint of sub-25 nm vias and trenches in polymers
    • S. Y. Chou, and P. R. Krauss: "Imprint of sub-25 nm vias and trenches in polymers", Appl. Phys., Lett. 67, pp. 3114-3116 (1995)
    • (1995) Appl. Phys., Lett , vol.67 , pp. 3114-3116
    • Chou, S.Y.1    Krauss, P.R.2
  • 2
    • 5344268855 scopus 로고    scopus 로고
    • J. Haisma, M. Verheijen, and K. Heuvel J.Bac : Mold-assisted nanolithography: A process for reliable pattern replication, J. Vac. Sci. Tecnol. B., 14, pp. 4124-4128 (1996)
    • J. Haisma, M. Verheijen, and K. Heuvel J.Bac : "Mold-assisted nanolithography: A process for reliable pattern replication", J. Vac. Sci. Tecnol. B., Vol.14, pp. 4124-4128 (1996)
  • 3
    • 0032204315 scopus 로고    scopus 로고
    • Fabrication, Writing, and Reading of 10 Gbits/in2 Longitudinal Quantized Magnetic Disks with a Switching Field over 1000 Oe
    • L. Kong, L. Zhuang, M. Li, B. Cui and S. Y. Chou : "Fabrication, Writing, and Reading of 10 Gbits/in2 Longitudinal Quantized Magnetic Disks with a Switching Field over 1000 Oe", Jpn. J. Appl. Phys., Vol.37, pp. 5973-5975 (1998)
    • (1998) Jpn. J. Appl. Phys , vol.37 , pp. 5973-5975
    • Kong, L.1    Zhuang, L.2    Li, M.3    Cui, B.4    Chou, S.Y.5
  • 4
    • 0034428091 scopus 로고    scopus 로고
    • Preparation of Diamond Mold Using Electron Beam Lithography for Application to Nanoimprint Lithography
    • J. Taniguchi, M. Komuro, S. Inoue, N. Kimura, Y. Tokano, H. Hiroshima and S. Matsui : "Preparation of Diamond Mold Using Electron Beam Lithography for Application to Nanoimprint Lithography", Jpn. J. Appl. Phys., Vol.39, pp. 7070-7074 (2000)
    • (2000) Jpn. J. Appl. Phys , vol.39 , pp. 7070-7074
    • Taniguchi, J.1    Komuro, M.2    Inoue, S.3    Kimura, N.4    Tokano, Y.5    Hiroshima, H.6    Matsui, S.7
  • 7
    • 15044345170 scopus 로고    scopus 로고
    • Methods for preparing patterned media for high-density recoading
    • Lodder J C : "Methods for preparing patterned media for high-density recoading", J. Magn. Magn. Mater. Vol.272-276, Part 3, pp. 1692-1697 (2004)
    • (2004) J. Magn. Magn. Mater , vol.272-276 , Issue.PART 3 , pp. 1692-1697
    • Lodder, J.C.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.