Micro patterning using UV-nanoimprint process

Journal of Photopolymer Science and Technology

Volumn 20, Issue 4, 2007, Pages 559-562

  Goto, Hiroshi ^a   Hagiwara, Akihiko ^a   Ishibashi, Kentaro ^a   Kokubo, Mitsunori ^a   Okuyama, Hiroshi ^a   Fukuyama, Satoshi ^a  

^a Toshiba Machine Co Ltd   (Japan)

Author keywords

MEMS; Mold; Nanoimprint; Replication; Roll to roll; UV resin

Indexed keywords

EID: 37548999328     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.20.559     Document Type: Article

References (4)

1. S.Y.Chou et al., J. Vac. Sci. Technol. B 14(6), (1996) 4129.
2. S.Y.Chou et al., Appl. Phys. Lett. 67, (1995) 3114.
3. International technology road map for semiconductors 2006 update (http://www.itrs.net/Links/2006Update/2006UpdateFinal.htm)
4. L Jay Guo : Recent progress in nanoimprint technology and its applications, J. Phys. D: Appl. Phys. 37 (2004) R123-R141