Application of nano-imprint lithography

Journal of Photopolymer Science and Technology

Volumn 15, Issue 3, 2002, Pages 475-480

  Hirai, Yoshihiko ^a   Tanaka, Yoshio ^a  

^a Osaka Prefecture University   (Japan)

Author keywords

Curved surface; Dots; Imprint lithography; Mold; Optical element; Surface treatment

Indexed keywords

GLASS; PLASTIC; POLY(METHYL METHACRYLATE); POLYLACTIC ACID; SILICON DIOXIDE;

ARTICLE; BIODEGRADABILITY; DEVICE; GLASS TRANSITION TEMPERATURE; GRATING; LITHOGRAPHY; NANOPARTICLE; OPTICS; SCANNING ELECTRON MICROSCOPY; SURFACE PROPERTY;

EID: 0036355560     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.15.475     Document Type: Article

References (12)