Proton beam written hydrogen silsesquioxane (HSQ) nanostructures for Nickel electroplating

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 267, Issue 12-13, 2009, Pages 2309-2311

  Gorelick, S ^a   Zhang, F ^b   Shao, P G ^b   van Kan, J A ^b   Whitlow, Harry J ^a   Watt, F ^b  

^a UNIVERSITY OF JYVÄSKYLÄ   (Finland)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

Cr; High aspect ratio; Hydrogen silsesquioxane; Ni electroplating; Proton beam writing; Ti

Indexed keywords

CR; HIGH ASPECT RATIO; HYDROGEN SILSESQUIOXANE; NI ELECTROPLATING; PROTON BEAM WRITING; TI;

ADHESION; CHEMICAL REACTIONS; CHROMIUM; DEBRIS; ELECTRON BEAM LITHOGRAPHY; ELECTROPLATING; HYDROGEN; ION BEAM LITHOGRAPHY; NANOFLUIDICS; NANOSTRUCTURES; NICKEL; PHOTORESISTS; PRESSURE DROP; PROTON BEAMS; PROTON IRRADIATION; PROTONS; SEMICONDUCTING GALLIUM COMPOUNDS; SUBSTRATES;

ASPECT RATIO;

EID: 66449124753     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2009.03.021     Document Type: Article

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