Filter windows for EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4343, Issue 1, 2001, Pages 585-589

  Powell, Forbes R ^a   Johnson, Terry A ^b  

^a Luxel Corporation   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

EUV lithography; Extreme ultraviolet; Filter transmittance; Filter windows; Filters; Soft x ray

Indexed keywords

IRRADIATION; LIGHT ABSORPTION; OPACITY; PHOTOLITHOGRAPHY; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY; FILTER WINDOWS;

OPTICAL FILTERS;

EID: 0034768310     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.436709     Document Type: Article

References (1)

1. X-ray interactions: Photoabsorption, scattering, transmission, and reflection, E=50-30,000 eV, Z=1-92