Mo/Si multilayers with enhanced TiO2- and RuO 2-capping layers

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6921, Issue , 2008, Pages

  Yulin, Sergiy ^a   Benoit, Nicolas ^a   Feigl, Torsten ^a   Kaiser, Norbert ^a   Fang, Ming ^b   Chandhok, Manish ^b  

^a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

^b INTEL CORPORATION   (United States)

Author keywords

Capping layer; Carbon growth; EUVL; Mo Si multilayer; Optics lifetime; RuO2; Surface oxidation; TiO2

Indexed keywords

CAPPING LAYER; CARBON GROWTH; MO/SI MULTILAYER; OPTICS LIFETIME; RUO2; SURFACE OXIDATION; TIO;

CARBONIZATION; DROPS; EXTREME ULTRAVIOLET LITHOGRAPHY; IRRADIATION; MIRRORS; OPTICS; OPTIMIZATION; OXIDATION; REFLECTION; RUTHENIUM; RUTHENIUM ALLOYS; RUTHENIUM COMPOUNDS; TITANIUM; TITANIUM DIOXIDE;

MULTILAYERS;

EID: 62649137063     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772653     Document Type: Conference Paper

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