Investigation of sensitivity of extreme ultraviolet resists to out-of-band radiation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6921, Issue , 2008, Pages

  Mbanaso, Chimaobi ^a   Denbeaux, Gregory ^a   Dean, Kim ^b   Brainard, Robert ^a   Kruger, Seth ^a   Hassanein, Elsayed ^a  

^a STATE UNIVERSITY OF NEW YORK   (United States)

^b SEMATECH   (United States)

Author keywords

Extreme ultraviolet (EUV) lithography; Out of band; Photoresists

Indexed keywords

ADVERSE EFFECT; EUV SOURCE; EXTREME ULTRAVIOLET; EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY; EXTREME ULTRAVIOLETS; IMAGE CONTRASTS; OUT-OF-BAND; OUT-OF-BAND RADIATION; PRINTED IMAGES; REFLECTIVE OPTICS;

DEUTERIUM; EXTREME ULTRAVIOLET LITHOGRAPHY; IMAGE QUALITY; LIGHT SOURCES; PHOTORESISTS;

LIGHT;

EID: 65849368798     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772695     Document Type: Conference Paper

References (8)

1. ITRS(International Technology Roadmap for Semiconductors) www.itrs.net (2006).
2. Van Herpen, M. M. J. W. Van de Kruijs, R. W. E, Louis, D. J. W., Klunder, E., Yakshin, A. E., Van der Westen, S. A., Bijkerk, F. and Banine, V., "Spectral-purity-enhancing layer for multilayer mirrors, " Optical Letters. 33, 560-562 (2008). (Pubitemid 351469879)
3. Cobb Jonathan L., Brainard Robert L., O'Connell Donna J., Dentinger and Paul M. "EUV Lithography: Patterning to the End of the Road, " Symp. Proc. Materials Research Society 705, (2002).
4. Brainard, Robert et al. "Photons, Electrons and Acid Yields in EUV Photoresists, ".Proc. SPIE 6921, (2008).
5. Roberts, Jeanette M., Meagley, Robert, Fedynyshyn, Theodore H., Sinta, Roger F., Astolfi, David K., Goodman, Russell B. and Cabral, Alberto. "Contributions to innate material roughness in resist, " Proc. SPIE, 6153, 61533U/1- 61533U/11 (2006).
6. Theodore H. Fedynyshyn, David K. Astolfi, Alberto Cabral, and Jeanette Roberts, "PAG segregation during exposure affecting innate material roughness" Proc. SPIE 6519, 65190X (2007).
7. Woodward, John T., Fedynyshyn, Theodore H., Astolfi, David K., Cann, Susan, Roberts, Jeanette M. and Leeson, Michael J. "Component segregation in model chemically amplified resists. Proc. SPIE 6519, 651915/1-651915/8, (2007).
8. Fedynyshyn, Theodore H., Pottebaum, Indira, Cabral, Alberto and Roberts, Jeanette, "Changes in resist glass transition temperatures due to exposure", Proc. SPIE, 6519, 651917/1-651917/12 (2007).