Direct patterning of zinc oxide with control of reflected color through nano-oxidation using an atomic force microscope

Nanotechnology

Volumn 20, Issue 5, 2009, Pages

  Hwang, Jih Shang ^a   Chen, Li Wei ^a   Chen, Te Chang ^a   Kuo, Chi Wen ^a   Hu, Zhan Shuo ^a   Tsai, Tsong Ru ^a   Wu, Yuen Jung ^a   Lin, Tai Yuan ^a   Jhuo, Yuan Yu ^a   Cheng, Chih Yung ^a   Lin, Chih Ming ^b   Liu, Yi Hung ^c  

^a NATIONAL TAIWAN OCEAN UNIVERSITY   (Taiwan)

^b NATIONAL TAITUNG UNIVERSITY   (Taiwan)

^c CHUNG YUAN CHRISTIAN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS ZNO; ATOMIC FORCE MICROSCOPES; COLOR SPECTRUM; DEVICE FABRICATIONS; DIFFRACTION LIMITS; DIRECT-PATTERNING; MULTILEVEL OPTICAL DATA STORAGES; NANO OXIDATIONS; REFLECTED COLORS; WHITE LIGHTS; ZNO;

COLOR; ELECTROMAGNETIC WAVE DIFFRACTION; LIGHT; OPTICAL DATA PROCESSING; OPTICAL DATA STORAGE; OXIDATION; SEMICONDUCTING ZINC COMPOUNDS; ZINC;

ZINC OXIDE;

ZINC OXIDE; NANOMATERIAL;

ARTICLE; ATOMIC FORCE MICROSCOPY; DIFFRACTION; NANOTECHNOLOGY; OXIDATION; PRIORITY JOURNAL; SEMICONDUCTOR; SIMULATION; SPECTROSCOPY; TECHNIQUE; THICKNESS; CHEMISTRY; COLOR; CONFORMATION; HARDNESS; MACROMOLECULE; MATERIALS TESTING; METHODOLOGY; MICROMANIPULATION; PARTICLE SIZE; REFRACTOMETRY; SURFACE PROPERTY; ULTRASTRUCTURE;

COLOR; HARDNESS; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; MICROMANIPULATION; MICROSCOPY, ATOMIC FORCE; MOLECULAR CONFORMATION; NANOSTRUCTURES; NANOTECHNOLOGY; PARTICLE SIZE; REFRACTOMETRY; SURFACE PROPERTIES; ZINC OXIDE;

EID: 64549084039     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/20/5/055302     Document Type: Article

References (31)

1. Snow E S, Campbell P M, Rendell R W, Buot F A, Park D, Marrian C R K and Magno R 1998 Appl. Phys. Lett. 72 3071
2. Garcia R, Calleja M and Rohrer H 1999 J. Appl. Phys. 86 1898
3. Cooper E B, Manalis S R, Fang H, Dai H, Matsumoto K, Minne S C, Hunt T and Quate C F 1999 Appl. Phys. Lett. 75 3566
4. Matsumoto K, Gotoh Y, Maeda T, Dagata J A and Harris J S 2000 Appl. Phys. Lett. 76 239
5. Chien F S S, Chou Y C, Chen T T, Hsieh W F, Chao T S and Gwo S 2001 J. Appl. Phys. 89 2465
6. Bouchiat V, Faucher M, Thirion C, Wernsdorfer W, Fournier T and Pannetier B 2001 Appl. Phys. Lett. 79 123
7. Pellegrino L, Pallecchi I, Marre D, Bellingeri E and Siri A S 2002 Appl. Phys. Lett. 81 3849
8. Dorn A, Sigrist M, Fuhrer A, Ihn T, Heinzel T, Ensslin K, Wegscheider W and Bichler M 2002 Appl. Phys. Lett. 80 252
9. Wouters D and Schubert U S 2004 Angew. Chem. Int. Edn 43 2480
10. Wu H M, Song Y L, Wen Y Q, Zhao T, Gao H J and Jiang L 2003 Prog. Nat. Sci. 13 247
11. Lyuksyutov S F, Paramonov P B, Juhl S and Vaia R A 2003 Appl. Phys. Lett. 83 4405
12. Lyuksyutov S F, Vaia R A, Paramonov P B, Juhl S, Waterhouse L, Ralich R M, Sigalov G and Sancaktar E 2003 Nat. Mater. 2 468
13. Xie X N, Chung H J, Sow C H and Wee A T S 2006 Mater. Sci. Eng. R 54 1
14. Minne S C, Soh H T, Flueckiger P and Quate C F 1995 Appl. Phys. Lett. 66 703
15. Matsumoto K, Takahashi S, Ishii M, Hoshi M, Kurokawa A, Ichimura S and Ando A 1995 Japan. J. Appl. Phys. 34 1387
16. Snow E S and Campbell P M 1995 Science 270 1639
17. Pallecchi I, Pellegrino L, Bellingeri E, Siri A S and Marre D 2004 J. Appl. Phys. 95 8079
18. Song I, Kim B M and Park G 2000 Appl. Phys. Lett. 76 601
19. Avouris P, Hertel T and Martel R 1997 Appl. Phys. Lett. 71 285
20. Garcia R, Calleja M and Perez-Murano F 1998 Appl. Phys. Lett. 72 2295
21. Fontaine P A, Dubois E and Stievenard D 1998 J. Appl. Phys. 84 1776
22. Gordon A E, Fayfield R T, Litfin D D and Higman T K 1995 J. Vac. Sci. Technol. B 13 2805
23. Chien F S S, Chang J W, Lin S W, Chou Y C, Chen T T, Gwo S, Chao T S and Hsieh W F 2000 Appl. Phys. Lett. 76 360
24. Xie X N, Chung H J, Sow C H and Wee A T S 2004 Appl. Phys. Lett. 84 4914
25. Okada Y, Amano S, Kawabe M and Harris J S 1998 J. Appl. Phys. 83 7998
26. Hwang J S, You Z Y, Lin S Y, Hu Z S, Wu C T, Chen C W and Chen K H 2005 Appl. Phys. Lett. 86 161901
27. Hwang J S, Hu Z S, You Z Y, Lin T Y, Hsiao C L and Tu L W 2006 Nanotechnology 17 859
28. Hwang J S, Hu Z S, Lu T Y, Chen L W, Chen S W, Lin T Y, Hsiao C L, Chen K H and Chen L C 2006 Nanotechnology 17 3299
29. Abouelela A H and Mahmoud S 1982 Phys. Status Solidi a 69 K193
30. Khoshman J M and Kordesch M E 2007 Thin Solid Films 515 7393
31. Tello M and Garcia R 2003 Appl. Phys. Lett. 83 2339