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Crystal Growth and Design

Volumn 9, Issue 2, 2009, Pages 880-884

Hot-wall MOCVD for highly efficient and uniform growth of AlN

(5) Kakanakova Georgieva, A a Ciechonski, R R a Forsberg, U a Lundskog, A a Janzen E a

a LINKÖPING UNIVERSITY (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 61749089523 PISSN: 15287483 EISSN: 15287505 Source Type: Journal
DOI: 10.1021/cg8005663 Document Type: Article

Times cited : (53)

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