Influence of the power on the particles generated in a low pressure radio frequency nitrogen-rich methane discharge

Journal of Applied Physics

Volumn 105, Issue 3, 2009, Pages

  Massereau Guilbaud, V́ronique ^a   Pereira, J́ŕmy ^a   Ǵraud Grenier, Isabelle ^a   Plain, Andŕ ^a  

^a UNIVERSITÉ D'ORLÉANS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC SPECTROSCOPY; ELECTRIC DISCHARGES; ELECTRIC POWER SYSTEMS; EMISSION SPECTROSCOPY; HELIUM; LIGHT SCATTERING; METHANE; MOLECULAR SPECTROSCOPY; OPTICAL EMISSION SPECTROSCOPY; PLASMAS; RADIO; RADIO WAVES; SCANNING ELECTRON MICROSCOPY;

ELECTRICAL PARAMETERS; EXCITED SPECIES; LASER LIGHT SCATTERINGS; LOW PRESSURES; OPTICAL EMISSIONS; PARTICLE FORMATIONS; PARTICLE GROWTHS; PARTICLE MORPHOLOGIES; PHASE ANGLES; RADIO FREQUENCIES; RADIO-FREQUENCY POWER SUPPLIES; SCANNING ELECTRONS; SELF-BIAS VOLTAGES; TEMPORAL EVOLUTIONS; THIRD HARMONICS;

PLASMA DIAGNOSTICS;

EID: 60449090715     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3072664     Document Type: Article

References (38)

1. G. M. Smadi, G. Y. Kong, R. N. Carlile, and S. E. Beck, J. Vac. Sci. Technol. B 1071-1023 10.1116/1.586351 10, 30 (1992).
2. S. Veprek, S. Reiprich, and L. Shizi, Appl. Phys. Lett. 0003-6951 10.1063/1.113110 66, 2640 (1995).
3. Y. Poissant, P. Chatterjee, and P. Roca i Cabarrocas, J. Non-Cryst. Solids 299-302, 1173 (2002). 0022-3093
4. Ch. Hollenstein, Plasma Phys. Controlled Fusion 0741-3335 10.1088/0741-3335/42/10/201 42, R93 (2000).
5. J. Berndt, S. Hong, E. Kovacevic, I. Stefanovic, and J. Winter, Vacuum 0042-207X 10.1016/S0042-207X(02)00767-4 71, 377 (2003).
6. G. Y. Chen, V. Stolojan, S. R. P. Silva, H. Herman, and S. Haq, Carbon 0008-6223 10.1016/j.carbon.2004.10.037 43, 704 (2005).
7. J. Ṕreira, V. Massereau-Guilbaud, I. Ǵraud-Grenier, and A. Plain, Plasma Processes Polym. 1612-8850 10.1002/ppap.200500014 2, 633 (2005).
8. J. Ṕreira, V. Massereau-Guilbaud, I. Ǵraud-Grenier, and A. Plain, J. Appl. Phys. 0021-8979 10.1063/1.2829782 103, 033301 (2008).
9. I. Ǵraud-Grenier, V. Massereau-Guilbaud, and A. Plain, Eur. Phys. J.: Appl. Phys. 1286-0042 10.1051/epjap:1999229 8, 53 (1999).
10. Y. A. Mankelevich, M. A. Olevanov, and T. V. Rakhimova, Plasma Sources Sci. Technol. 0963-0252 10.1088/0963-0252/17/1/015013 17, 015013 (2008).
11. V. Massereau-Guilbaud, I. Ǵraud-Grenier, and A. Plain, Eur. Phys. J.: Appl. Phys. 1286-0042 10.1051/epjap:2000146 11, 71 (2000).
12. C. Zafiu, A. Melzer, and A. Piel, Phys. Plasmas 1070-664X 10.1063/1.1516598 9, 4794 (2002).
13. J. C. Schauer, S. Hong, and J. Winter, Plasma Sources Sci. Technol. 0963-0252 10.1088/0963-0252/13/4/012 13, 636 (2004).
14. S. Hong, J. Berndt, and J. Winter, Plasma Sources Sci. Technol. 0963-0252 10.1088/0963-0252/12/1/306 12, 46 (2003).
15. M. Mikikian, L. Boufendi, A. Bouchoule, H. M. Thomas, G. E. Morfill, A. P. Nefedov, V. E. Fortov, and PKE-Nefedov Team, New J. Phys. 5, 19 (2003). 0963-0252
16. I. Ǵraud-Grenier, V. Massereau-Guilbaud, and A. Plain, Eur. Phys. J.: Appl. Phys. 1286-0042 10.1051/epjap:2001158 14, 187 (2001).
17. M. Klick, J. Appl. Phys. 0021-8979 10.1063/1.361392 79, 3445 (1996).
18. S. Dine, Ph.D. thesis, University of Paris XI Orsay, France, 2006.
19. Z. Shen and U. Kortshagen, J. Vac. Sci. Technol. A 0734-2101 10.1116/1.1427894 20, 153 (2002).
20. O. Leroy, H. Videlot, and J. Jolly, Eur. Phys. J.: Appl. Phys. 1286-0042 16, 121 (2001).
21. E. G. Wang, Z. G. Guo, J. Ma, M. M. Zhou, Y. K. Pu, S. Liu, G. Y. Zhang, and D. Y. Zhong, Carbon 0008-6223 10.1016/S0008-6223(03)00155-6 41, 1827 (2003).
22. M. Cavarroc, M. Mikikian, G. Perrier, and L. Boufendi, Appl. Phys. Lett. 0003-6951 10.1063/1.2219395 89, 013107 (2006).
23. A. C. Ferrari, S. E. Rodil, and J. Robertson, Phys. Rev. B 0163-1829 10.1103/PhysRevB.67.155306 67, 155306 (2003).
24. J. Ṕreira, I. Ǵraud-Grenier, V. Massereau-Guilbaud, and A. Plain, Surf. Coat. Technol. 0257-8972 10.1016/j.surfcoat.2005.11.004 200, 6414 (2006).
25. K. S. Kim, D. J. Kim, J. H. Yoon, J. Y. Park, Y. Watanabe, and M. Shiratani, J. Colloid Interface Sci. 0021-9797 10.1016/S0021-9797(02)00049-8 257, 195 (2003).
26. C. Deschenaux, Ph.D. thesis, Ecole Polytechnique of Lausanne, Switzerland, 2002.
27. L. Boufendi, J. Gaudin, S. Huet, G. Viera, and M. Dudemaine, Appl. Phys. Lett. 0003-6951 10.1063/1.1425431 79, 4301 (2001).
28. R. Ghidini, C. H. J. M. Groothuis, M. Sorokin, G. M. W. Kroesen, and W. W. Stoffels, Plasma Sources Sci. Technol. 0963-0252 10.1088/0963-0252/13/1/018 13, 143 (2004).
29. S. Y. Savinov, H. Lee, H. K. Song, and B. Na, Ind. Eng. Chem. Res. 0888-5885 38, 2540 (1999).
30. A. Qayyum, S. Zeb, M. A. Naveed, N. U. Rehman, S. A. Ghauri, and M. Zakaullah, J. Quant. Spectrosc. Radiat. Transf. 0022-4073 10.1016/j.jqsrt.2007. 02.008 107, 361 (2007).
31. P. Hammer, M. A. Baker, C. Lenardi, and W. Gissler, Thin Solid Films 0040-6090 290-291, 107 (1996).
32. T. Schwarz-Selinger, C. Hopf, C. Sun, and W. Jacob, J. Nucl. Mater. 363-365, 174 (2007). 0022-3115
33. A. A. Fridman, L. Boufendi, T. Hbid, B. V. Potapkin, and A. Bouchoule, J. Appl. Phys. 0021-8979 10.1063/1.361026 79, 1303 (1996).
34. U. Kortshagen and U. Bhandarkar, Phys. Rev. E 1063-651X 10.1103/PhysRevE.60.887 60, 887 (1999).
35. I. Denysenko, Y. Yu, K. Ostrikov, and L. Stenflo, Phys. Plasmas 1070-664X 10.1063/1.1793174 11, 4959 (2004).
36. D. Z. Wang and J. Q. Dong, J. Appl. Phys. 0021-8979 10.1063/1.364124 81, 38 (1997).
37. H. Chatei, J. Bougdira, M. Remy, and P. Alnot, Surf. Coat. Technol. 116-119, 1233 (1999). 0257-8972
38. F. D. A. Aarão Reis and D. F. Franceschini, Appl. Phys. Lett. 0003-6951 10.1063/1.123295 74, 209 (1999).