Electrical and optical characterization of particle formation in an argon-silane capacitively coupled radio-frequency discharge

Plasma Sources Science and Technology

Volumn 13, Issue 1, 2004, Pages 143-149

  Ghidini, R ^a,b   Groothuis, C H J M ^a   Sorokin, M ^a   Kroesen, G M W ^a   Stoffels, W W ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b UNIVERSITY OF BOLOGNA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

PLASMA EMISSIONS; PLASMA REACTORS;

AGGLOMERATION; ARGON; CHEMICAL BONDS; ELECTRIC CURRENTS; ELECTRIC POTENTIAL; HYDROGEN; LASER APPLICATIONS; LIGHT SCATTERING; NUCLEATION; POLYMERIZATION; SILANES; SILICON;

INDUCTIVELY COUPLED PLASMA;

EID: 1642370814     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/13/1/018     Document Type: Article

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