CH and CN radical contribution in the particle formation generated in a radio-frequency CH4/N2 plasma

Plasma Processes and Polymers

Volumn 2, Issue 8, 2005, Pages 633-640

  Pereira, Jérémy ^a   Massereau Guilbaud, Véronique ^a   Géraud Grenier, Isabelle ^a   Plain, André ^a  

^a UNIVERSITÉ D'ORLÉANS   (France)

Author keywords

Carbon nitride particles; CH and CN radicals; Dust plasma; Growth; Infrared analysis; Optical emission spectroscopy(OES); Particle size distribution

Indexed keywords

CHEMICAL MODIFICATION; EMISSION SPECTROSCOPY; FREE RADICALS; HYDROGEN BONDS; MIXTURES; MORPHOLOGY; NITROGEN; ORGANIC COATINGS; PARTICLE SIZE ANALYSIS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; SCANNING ELECTRON MICROSCOPY;

CARBON NITRIDE PARTICLES; DUSTY PLASMA; INFRARED ANALYSIS; OPTICAL EMISSION SPECTROSCOPY (OES);

CARBON NITRIDE;

EID: 27644534599     PISSN: 16128850     EISSN: None     Source Type: Journal    
DOI: 10.1002/ppap.200500014     Document Type: Article

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