Plasma enhanced CVD of fluorocarbon films by low-pressure dielectric barrier discharge

Surface and Coatings Technology

Volumn 203, Issue 9, 2009, Pages 1231-1236

  Liu, Dongping ^a   Li, Wei ^a,b   Feng, Zhiqing ^a   Tan, Xiaodong ^b   Chen, Baoxiang ^a   Niu, Jinhai ^a   Liu, Yanhong ^c  

^a DALIAN NATIONALITIES UNIVERSITY   (China)

^b DALIAN JIAOTONG UNIVERSITY   (China)

^c DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Dielectric barrier discharge; Fluorocarbon films; Plasma deposition

Indexed keywords

ANGLE MEASUREMENT; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; CONTACT ANGLE; DIELECTRIC DEVICES; ELECTRIC DISCHARGES; ELECTRIC POWER DISTRIBUTION; ELECTRIC POWER TRANSMISSION NETWORKS; ELECTRIC POWER UTILIZATION; ELECTRODEPOSITION; FLOW CONTROL; NANOFLUIDICS; PHOTOELECTRON SPECTROSCOPY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC FORCES; CROSS-LINKED STRUCTURES; DEPOSITED FILMS; DEPOSITION PRESSURES; DIELECTRIC BARRIER DISCHARGE; DISCHARGE PRESSURES; FILM QUALITIES; FLUOROCARBON FILMS; HIGH PRESSURES; HYDROPHOBIC PROPERTIES; PLASMA PARAMETERS; PLASMA-ENHANCED CVD; POWER SUPPLIES; PRESSURE DIELECTRIC BARRIER DISCHARGES; SCANNING ELECTRONS; SILICON SUBSTRATES; STATIC CONTACT ANGLES; UNIFORM MICROSTRUCTURES; X-RAY PHOTOELECTRON SPECTROSCOPIES;

PLASMA DEPOSITION;

EID: 58849138725     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.10.023     Document Type: Article

References (28)

1. Takahashi K., Mitamura T., Ono K., Setsuhara Y., Itoh A., and Tachibana T. Appl. Phys. Lett. 82 (2003) 2476
2. Thomson L.A., Law F.C., James K.H., and Rushton N. Biomaterials 12 (1991) 781
3. Guidoin R., Chakfe N., Maurel S., How T., Batt M., Marois M., and Gosselin C. Biomaterials 14 (1993) 678
4. Lau K.K.S., Bico J., Teo K.B., Chhowalla M., Amaratunga G.A.J., Milne W.I., McKinley G.H., and Gleason K.K. Nano Lett. 12 (2003) 1701
5. Vaswani S., Koskinen J., and Hess D.W. Surf. Coat. Technol. 195 (2005) 121
6. Mackie N.M., Dalleska N.F., Castner D.G., and Fisher E.R. Chem. Mater. 9 (1997) 349
7. Butoi C.I., Mackie N.M., Williams K.L., Capps N.E., and Fisher E.R. J. Vac. Sci. Technol., A 18 (2000) 2685
8. Martin I.T., and Fisher E.R. J. Vac. Sci. Technol., A 22 (2004) 2168
9. Takahashi K., and Tachibana K. J. Appl. Phys. 89 (2001) 893
10. Labelle C.B., Limb S.J., and Gleason K.K. J. Appl. Phys. 82 (1997) 1784
11. Labelle C.B., and Gleason K.K. J. Appl. Polym. Sci. 74 (1999) 2439
12. Labelle C.B., and Gleason K.K. J. Appl. Polym. Sci. 80 (2001) 2084
13. Capps N.E., Mackie N.M., and Fisher E.R. J. Appl. Phys. 84 (1998) 4736
14. Limb S.J., Labelle C.B., and Gleason K.K. Appl. Phys. Lett. 68 (1996) 2810
15. Cruden B.A., Gleason K.K., and Sawin H.H. J. Vac. Sci. Technol., B 20 (2002) 690
16. Rastogi A.C., and Desu S.B. Polymer 46 (2005) 3440
17. Vinogradov I.P., Dinkelmann A., and Lunk A. Surf. Coat. Technol. 174-175 (2003) 509
18. Vinogradov I.P., Dinkelmann A., and Lunk A. J. Phys. D: Appl. Phys. 37 (2004) 3000
19. Liu D., Ma T., Yu S., Xu Y., and Yang X. J. Phys. D: Appl. Phys. 34 (2001) 1651
20. Liu D., Yu S., Liu Y., Ren C., Zhang J., and Ma T. Thin Solid Films 414 (2002) 163
21. Milella A., Palumbo F., Favia P., Cicala G., d R., and 'Agostino. Plasma Process. Polym. 1 (2004) 164
22. Butoi C.I., Mackie N.M., Gamble L.J., Castner D.G., Barnd J., Miller A.M., and Fisher E.R. Chem. Mater. 12 (2000) 2014
23. Luginbuhl R., Garrison M.D., Overney R.M., Weiss L., Schieferdecker H., Hild S., and Ratner B.D. In: Castner D.G., and Grainger D.W. (Eds). Fluorinated Surfaces, Conatings, and Films (2001), American Chemical Society, Washington, D. C.
24. Martin I.T., Malkov G.Sh., Butoi C.I., and Fisher E.R. J. Vac. Sci. Technol., A 22 (2004) 227
25. d'Agostino R., Cramarossa F., and Fracassi F. In: d'Agostino R. (Ed). Plasma Deposition, Treatment, and Etching of Fluorcarbons (1990), Academic Press, Inc., San Diego 95
26. Liu D., Martin I.T., and Fisher E.R. Chem. Phys. Lett. 430 (2006) 113
27. Liu D., Xu Y., Yang X., Yu S., Sun W., Zhu A., and Ma T. Diamond Relat. Mater. 11 (2002) 1491
28. Lau K.K.S., Caulfield J.A., and Gleason K.K. Chem. Mater. 12 (2000) 3032