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Journal of Physics D: Applied Physics

Volumn 34, Issue 11, 2001, Pages 1651-1656

Plasma-assisted CVD of hydrogenated diamond-like carbon films by low-pressure dielectric barrier discharges

(5) Liu, Dongping a Ma, Tengcai a Yu, Shiji a Xu, Yong a Yang, Xuefeng a

a DALIAN UNIVERSITY OF TECHNOLOGY (China)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; BONDING; ELECTRIC POTENTIAL; FOURIER TRANSFORM INFRARED SPECTROSCOPY; METHANE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PRESSURE EFFECTS; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON; TEMPERATURE; VOLTAGE MEASUREMENT;

CURRENT WAVEFORM MEASUREMENTS; DIELECTRIC BARRIER DISCHARGE PLASMAS; GAS PRESSURE DISCHARGE; GAS SPACING DISCHARGE; HYDROGENATED AMORPHOUS CARBON FILMS;

DIAMOND LIKE CARBON FILMS;

EID: 0035821672 PISSN: 00223727 EISSN: None Source Type: Journal
DOI: 10.1088/0022-3727/34/11/315 Document Type: Article

Times cited : (46)

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