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Volumn 255, Issue 8, 2009, Pages 4664-4669
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Dose and pressure dependence of silicon microstructure in SF 6 gas due to excimer laser irradiation
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Author keywords
ArF laser; Resonance pattern; Si microstructure; Surface wave
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Indexed keywords
EXCIMER LASERS;
FLUID MECHANICS;
HEAT TRANSFER;
LASER BEAM EFFECTS;
MICROSTRUCTURE;
SULFUR HEXAFLUORIDE;
SURFACE WAVES;
ARF EXCIMER LASER RADIATIONS;
ARF LASER;
MOLTEN SILICON;
PRESSURE DEPENDENCE;
RESONANCE PATTERNS;
RIGOROUS MODEL;
SILICON MICROSTRUCTURES;
UV LASER INTERACTION;
SILICON;
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EID: 58349095768
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/j.apsusc.2008.12.024 Document Type: Article |
Times cited : (18)
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References (30)
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