Early stages of pulsed-laser growth of silicon microcolumns and microcones in air and SF6

Applied Surface Science

Volumn 154, Issue , 2000, Pages 647-658

  Lowndes, Douglas H ^a   Fowlkes, Jason D ^b   Pedraza, Antonio J ^b  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

^b University of Tennessee Knoxville   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AIR; COMPOSITION EFFECTS; CRYSTAL MICROSTRUCTURE; DEPOSITION; LASER ABLATION; PULSED LASER APPLICATIONS; SEMICONDUCTING SILICON; SEMICONDUCTOR GROWTH; SINGLE CRYSTALS; SULFUR COMPOUNDS; SURFACE STRUCTURE; SURFACE TREATMENT;

MICROCOLUMNS; MICROCONES; SULFUR HEXAFLUORIDE;

SEMICONDUCTING FILMS;

EID: 0033892561     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(99)00369-4     Document Type: Article

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