Measurement of optical and electrical properties of silicon microstructuring induced by ArF excimer laser at SF 6 atmosphere

Applied Surface Science

Volumn 254, Issue 9, 2008, Pages 2621-2628

  Bassam, M A ^a   Parvin, P ^b   Sajad, B ^c   Moghimi, A ^a   Coster, H ^d  

^a IMAM HOSSEIN UNIVERSITY   (Iran)

^b AMIRKABIR UNIVERSITY OF TECHNOLOGY   (Iran)

^c ALZAHRA UNIVERSITY   (Iran)

^d UNIVERSITY OF SYDNEY   (Australia)

Author keywords

Electrical impedance spectroscopy (EIS) measurement; Excimer laser; Photospectroscopy; Silicon microstructure

Indexed keywords

ARGON; ELECTRIC PROPERTIES; EXCIMER LASERS; MICROSTRUCTURE; OPTICAL PROPERTIES; SELF ASSEMBLY;

ELECTRICAL IMPEDANCE SPECTROSCOPY (EIS) MEASUREMENT; PHOTOSPECTROSCOPY; SILICON MICROSTRUCTURE;

SILICON WAFERS;

EID: 38949121678     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.09.106     Document Type: Article

References (30)

1. Her T.H., Finlay R.J., Wu C., Deliwala S., and Mazur E. Appl. Phys. Lett. 73 (1998) 1673
2. Pedraza A.J., Fowlkes J.D., and Lowndes D.H. Appl. Phys. Lett. 74 16 (1999) 2322
3. Fowlkes J.D., Pedraza A.J., and Lowndes D.H. Appl. Phys. Lett. 77 11 (2000) 1629
4. Sanchez F., Morenza J.L., Aguiar R., Delgado J.C., and Varela M. Appl. Phys. Lett. 69 5 (1996) 620
5. Her T.H., Finlay R.J., Wu C., and Mazur E. Appl. Phys. A 70 (2000) 383
6. Zorba V., Alexandrou I., Zergioti I., Manousaki A., Ducati C., Neumeister A., Fotakis C., and Amaratung G.A.J. Thin Solid Films 453/454 (2004) 492
7. Skantzakis E., Zorba V., Papazoglou D.G., Zergioti I., and Fotakis C. Appl. Surf. Sci. 252 (2006) 4462
8. Zhu J., Yin G., Zhao M., Chen D., and Zhao L. Appl. Surf. Sci. 245 (2005) 102
9. Zhao M., Yin G., Zhu J.T., and Zhao L. Chin. Phys. Lett. 20 10 (2003) 1789
10. Zhu J.T., Shen Y.F., Li W., Chen X., Yin G., Chen D.Y., and Zhao L. Appl. Surf. Sci. 252 (2006) 2752
11. Lowndes D.L., Fowlkes J.D., and Pedraza A.J. Appl. Surf. Sci. 154/155 (2000) 647
12. Crouch C.H., Carey J.E., Warrender J.M., Aziz M.J., Mazur E., and Genin F.Y. Appl. Phys. Lett. 84 11 (2004) 1850
13. Wu C., Crouch C.H., Zhao L., Carey J.E., Younkin R., Levinson J.A., and Mazur E. Appl. Phys. Lett. 78 13 (2001) 1850
14. Younkin R.J., Carey J.E., Mazur E., Levinson J., and Friend C. J. Appl. Phys. 93 (2003) 2626
15. Nayak B.K., Gupta M.C., and Kolasinski K.W. Appl. Surf. Sci. 253 (2007) 6580
16. Nayak B.K., Gupta M.C., and Kolasinski K.W. Nanotechnology 18 (2007) 195302
17. Riedel D., Hernandez-Pozos J.L., Palmer R.E., and Kolasinski K.W. Appl. Phys. A 78 (2004) 381
18. Mills D., Kreouzis T., Sapelkin A., Unal B., Zyuzikov N., and Kolasinski K.W. Appl. Surf. Sci. 253 (2007) 6575
19. Mills D., and Kolasinski K.W. J. Phys. D: Appl. Phys. 38 (2005) 632
20. Mills D., and Kolasinski K.W. J. Vac. Sci. Technol. A 22 4 (2004) 1647
21. Shen M.Y., Crouch C.H., Carey J.E., Younkin R., Mazur E., Sheehy M., and Friend C.M. Appl. Phys. Lett. 82 11 (2003) 1715
22. Foltyn S.R. In: Chrisey D.B., and Hubler G.K. (Eds). Pulsed Laser Deposition of Thin Films (1994), J. Wiley, New York (Chapter 4)
23. Cunge G., Chabert P., and Booth J.P. Plasma Sour. Sci. Technol. 6 (1997) 349
24. Chuang T.J. J. Chem. Phys. 74 2 (1981) 1453
25. Sajad B., Parvin P., and Bassam M.A. J. Phys. D: Appl. Phys. 37 (2004) 3402
26. Bauerle D. Laser Processing and Chemistry. 3rd ed. (2000), Springer, New York (Chapter 15)
27. Coster H.G.L., Chilcott T.C., and Coster A.C.F. Bioelectrochem. Bioenerg. 40 (1996) 79
28. Llopis F., and Tobías I. Prog. Photovoltaics 13 (2005) 27
29. Campbell P. J. Opt. Soc. Am. B 10 (1993) 2410
30. Wong E., Chilcott T., James M., and Coster H. Biophys. Rev. Lett. 1 3 (2006) 1