SF6 decomposition and layer formation due to excimer laser photoablation of SiO2 surface at gas-solid system

Journal of Physics D: Applied Physics

Volumn 37, Issue 24, 2004, Pages 3402-3408

  Sajad, Batool ^a,b   Parvin, Parviz ^a,c   Bassam, Mohamad Amin ^d  

^a AMIRKABIR UNIVERSITY OF TECHNOLOGY   (Iran)

^b ALZAHRA UNIVERSITY   (Iran)

^c ATOMIC ENERGY ORGANIZATION OF IRAN   (Iran)

^d Emam Hussain University   (Iran)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; CHEMICAL VAPOR DEPOSITION; DECOMPOSITION; ETCHING; EXCIMER LASERS; PHOTODISSOCIATION; SILICA; THERMAL PLUMES; ULTRAVIOLET RADIATION; VACUUM;

GAS PRESSURE; MOLECULAR DECOMPOSITION; PHOTOABLATION; WAVELENGTHS;

SULFUR COMPOUNDS;

EID: 11144299735     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/37/24/008     Document Type: Article

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