Laser microstructuring of Si surfaces for low-threshold field-electron emission

Thin Solid Films

Volumn 453-454, Issue , 2004, Pages 492-495

  Zorba, V ^a   Alexandrou, I ^b   Zergioti, I ^a,c   Manousaki, A ^a   Ducati, C ^b   Neumeister, A ^a   Fotakis, C ^a   Amaratunga, G A J ^b  

^a INSTITUTE OF ELECTRONIC STRUCTURE AND LASER   (Greece)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^c NATIONAL TECHNICAL UNIVERSITY OF ATHENS   (Greece)

Author keywords

Field emission; Laser materials processing; Microstructures

Indexed keywords

ASPECT RATIO; CARBON NANOTUBES; DECORATION; ELECTRIC POTENTIAL; ELECTRON EMISSION; LASER BEAM EFFECTS; LASER PULSES; MICROSTRUCTURE; SCANNING ELECTRON MICROSCOPY; SINGLE CRYSTALS; SULFUR COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

FIELD EMISSIONS; LASER MATERIALS PROCESSING; MICROTIP ARRAYS;

SILICON WAFERS;

EID: 1542635294     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.11.144     Document Type: Conference Paper

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