A comprehensive resist model for the prediction of line-edge roughness material and process dependencies in optical lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6923, Issue , 2008, Pages

  Schnattinger, Thomas ^a   Erdmann, Andreas ^a  

^a FRAUNHOFER INSTITUTE FOR INTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB   (Germany)

Author keywords

Development; Dr.LiTHO; Exposure; LER; Mesoscopic; Modeling; PEB; Resist; Simulation

Indexed keywords

EID: 57649094587     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772507     Document Type: Conference Paper

References (31)

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