New stochastic post-exposure bake simulation method

Journal of Microlithography, Microfabrication and Microsystems

Volumn 4, Issue 4, 2005, Pages

  Mülders, Thomas ^a   Henke, Wolfgang ^a   Elian, Klaus ^a   Nölscher, Christoph ^a   Sebald, Michael ^a  

^a INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

Line edge roughness; Post exposure bake; Stochastic simulation

Indexed keywords

DIFFUSION; MICROSCOPIC EXAMINATION; MOLECULAR DYNAMICS; PHOTORESISTS; REACTION KINETICS; STATISTICAL METHODS;

LINE EDGE ROUGHNESS; POST-EXPOSURE BAKE; STOCHASTIC SIMULATION;

PHOTOLITHOGRAPHY;

EID: 33747627830     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.2136867     Document Type: Article

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