Three-dimensional resist development simulation with discrete models

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 6, 2006, Pages 3040-3043

  Schnattinger, T ^a   Bar E ^a   Erdmann, A ^a  

^a FRAUNHOFER INSTITUTE FOR INTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTATIONAL GEOMETRY; COMPUTER SIMULATION; DISSOLUTION; FINITE DIFFERENCE METHOD; MATHEMATICAL MODELS; PROBLEM SOLVING;

LINE EDGE ROUGHNESS (LER); MACROSCOPIC PROFILES; POLYMER SIZE;

SURFACE ROUGHNESS;

EID: 33845263943     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2397071     Document Type: Article

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