Ionic photoacid generators containing functionalized semifluorinated sulfonates for high resolution lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6923, Issue , 2008, Pages

  Yi, Yi ^a   Ayothi, Ramakrishnan ^a   Ober, Christopher K ^a   Yueh, Wang ^b   Cao, Heidi ^b  

^a School of Operations Research and Industrial Engineering   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

EUV lithography; Line edge roughness; PFOS; Photoacid generator

Indexed keywords

ACID DIFFUSIONS; ACID STRENGTHS; EUV LITHOGRAPHY; EXCELLENT SOLUBILITIES; FUNCTIONALIZED; HIGH RESOLUTION LITHOGRAPHIES; HIGH THERMAL STABILITIES; HOST MATRIXES; LINE EDGE ROUGHNESS; PFOS; PHOTOACID GENERATOR; PHOTOACID GENERATORS; RESIST MATERIALS;

FUNCTIONAL POLYMERS; LITHOGRAPHY; ORGANIC COMPOUNDS; ORGANIC SOLVENTS; PHOTORESISTS; POLYMERS; ULTRAVIOLET DEVICES;

PHOTORESISTORS;

EID: 57349164824     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772880     Document Type: Conference Paper

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