Diffusion and distribution studies of photoacid generators: Ion beam analysis in lithography

Journal of Photopolymer Science and Technology

Volumn 12, Issue 3, 1999, Pages 457-468

  Sundararajan, Narayan ^a,c   Keimel, Christopher F ^a,b   Bhargava, Navin ^a   Ober, Christopher K ^a   Opitz, Juliann ^a,b   Allen, Robert D ^a   Barclay, George ^b   Xu, Guangyu ^a,b  

^a Cornell University   (United States)

^b IBM ALMADEN RESEARCH CENTER   (United States)

^c SHIPLEY COMPANY   (United States)

Author keywords

Diffusion; Distribution; Photoacid generator; Polarity; Rutherford backscattering

Indexed keywords

EID: 0001534587     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.12.457     Document Type: Article

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