Design and chemistry of advanced deep-UV photoresists: The role of the photoacid generator

Journal of Photopolymer Science and Technology

Volumn 12, Issue 4, 1999, Pages 607-620

  Cameron, James F ^a   Ablaza, Sheri L ^a   Xu, Guangyu ^a   Yueh, Wang ^a  

^a SHIPLEY COMPANY   (United States)

Author keywords

Chemically amplified resists; Deep UV resists; Photoacid generator

Indexed keywords

EID: 0000311160     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.12.607     Document Type: Article

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