Effect of Coulomb interaction and pKa on acid diffusion in chemically amplified resists

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 2, 1999, Pages 350-354

  Shi, Xuelong ^a  

^a NATIONAL SEMICONDUCTOR CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000913880     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590562     Document Type: Article

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