The piezoresistance effect of FIB-deposited carbon nanowires under severe strain

Journal of Micromechanics and Microengineering

Volumn 18, Issue 6, 2008, Pages

  Kiuchi, Mario ^a   Matsui, Shinji ^b,c   Isono, Yoshitada ^d  

^a RITSUMEIKAN UNIVERSITY   (Japan)

^b UNIVERSITY OF HYOGO   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^d KOBE UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS CARBON; AMPLIFICATION; CHEMICAL VAPOR DEPOSITION; ELECTRIC WIRE; ELECTROSTATIC ACTUATORS; ELECTROSTATIC DEVICES; ELECTROSTATICS; FOCUSED ION BEAMS; GAGES; ION BEAM ASSISTED DEPOSITION; ION BEAMS; NANOWIRES; TENSILE TESTING;

CARBON NANOWIRES; DEPOSITED CARBONS; ELECTRICAL CONDUCTIONS; ELECTROSTATIC COMB DRIVES; FRACTURE STRESSES; GAUGE FACTORS; HYDROGENATED AMORPHOUS CARBONS; NANOMECHANICAL SENSORS; PIEZORESISTANCE EFFECTS; RESISTANCE CHANGES; TENSILE LOADS; TENSILE TESTING DEVICES; UNIAXIAL TENSILE STRAINS; YOUNG'S MODULUS;

TENSILE STRAIN;

EID: 57249101883     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/18/6/065011     Document Type: Conference Paper

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