Carbon multiprobes with nanosprings integrated on Si cantilever using focused-ion-beam technology

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 7 B, 2005, Pages 5409-5412

  Nagase, Masao ^a   Nakamatsu, Kenichiro ^b,c   Matsui, Shinji ^b,c   Namatsu, Hideo ^a  

^a Kashino Diverse Brain Research Laboratory of NTT Communication Science Laboratories   (Japan)

^b University of Hyogo   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Cantilever; Carbon probe; FIB deposition; Focused ion beam; Four point probe; Nano electromechanical system; Nanospring; Nanotechnology; Resistivity measurement; Scanning probe microscopy

Indexed keywords

CANTILEVER BEAMS; CHEMICAL VAPOR DEPOSITION; ELECTRODES; ION BEAMS; NANOTECHNOLOGY; SILICON;

CARBON PROBE; FOUR-POINT PROBE; NANOSPRING;

CARBON;

EID: 31844438015     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.44.5409     Document Type: Article

References (10)

1. C. L. Petersen, G. Grey, I. Shiraki and S. Hasegawa: Appl. Phys. Lett. 77 (2000) 3782.
2. I. Shiraki, F. Tanabe, R. Hobara, T. Nagao and S. Hasegawa: Surf. Sci. 493(2001)633.
3. I. Shiraki, T. Nagao and S. Hasegawa: Surf. Rev. Lett. 7 (2000) 533.
4. P. Boøggild, T. M. Hansen, O. Kuhn, F. Grey, T. Junno and L. Montelius: Rev. Sci. Instrum. 71 (2000) 2781.
5. M. Nagase, H. Takahashi, Y. Shirakawabe and H. Namatsu: Jpn. J. Appl. Phys. 42 (2003) 4856.
6. M. Nagase and H. Namatsu: Jpn. J. Appl. Phys. 43 (2004) 4624.
7. S. Matsui, T. Kaitio, J. Fujita, M. Komuro, K. Kanda and Y. Haruyama: J. Vac. Sci. & Technol. B 18 (2000) 3181.
8. T. Morita, K. Nakamatsu, K. Kanda, Y. Haruyama, K. Kondo, T. Hoshino, T. Kaitio, J. Fujita, T. Ichihashi, M. Ishida, Y. Ochiai, T. Tajima and S. Matsui: J. Vac. Sci. & Technol. B 22 (2004) 3137.
9. J. Fujita, M. Ishida, T. Sakamoto, Y. Ochiai, T. Kaito and S. Matsui: J. Vac. & Sci. Technol. B 19 (2001) 2834.
10. G. Zhang and Y. Zhao: J. Appl. Phys. 95 (2004) 267.