Development of three-dimensional pattern-generating system for focused-ion-beam chemical-vapor deposition

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 6, 2003, Pages 2732-2736

  Hoshino, T ^a,b,c   Watanabe, K ^a,b   Kometani, R ^a,b   Morita, T ^a,b   Kanda, K ^a,b   Haruyama, Y ^a,b   Kaito, T ^e   Fujita, J ^a,d   Ishida, M ^a,d   Ochiai, Y ^a,d   Matsui, S ^a,b  

^a JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^b UNIVERSITY OF HYOGO   (Japan)

^c UNIVERSITY OF TOKYO   (Japan)

^d SEIKO INSTRUMENTS INC   (Japan)

^e NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACTUATORS; CHEMICAL VAPOR DEPOSITION; COMPUTER AIDED DESIGN; MULTILAYERS; NANOSTRUCTURED MATERIALS; OPTICAL INSTRUMENT LENSES; SENSORS;

PATTERN GENERATING SYSTEMS;

ION BEAM ASSISTED DEPOSITION;

EID: 0942278346     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1627812     Document Type: Conference Paper

References (4)

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2. A. J. DeMarco and J. Melngailis, J. Vac. Sci. Technol. B 17, 3154 (1999).
3. S. Kinoshita, S. Yoshioka, Y. Fujii, and N. Okamoto, FORMA 17, 103 (2002).
4. H. Kikuta and K. Iwata, IEICE Trans. J83-C, 173 (2000).