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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 3 B, 2006, Pages 2009-2013

Carbon multiprobe on a Si cantilever for pseudo-metal-oxide-semiconductor field-effect-transistor

(5) Nagase, Masao a Nakamatsu, Kenichiro b,c Matsui, Shinji b,c Namatsu, Hideo a Yamaguchi, Hiroshi a

a NTT Basic Research Laboratories (Japan)

b UNIVERSITY OF HYOGO (Japan)

c JAPAN SCIENCE AND TECHNOLOGY AGENCY (Japan)

Author keywords

Cantilever; Carbon probe; ECR sputtered carbon; FIB deposition; Focused ion beam; Multiprobe; Nano electromechanical system; Nanospring; Nanotechnology; Pseudo MOSFET; Scanning probe microscopy; SOI

Indexed keywords

CARBON; ELECTRON CYCLOTRON RESONANCE; ION BEAM ASSISTED DEPOSITION; PROBES; SEMICONDUCTING FILMS; SILICON;

CANTILEVERS; CARBON PROBE; ECR SPUTTERED CARBON; FIB DEPOSITION; FOCUSED ION BEAM; MULTIPROBE; NANO-ELECTROMECHANICAL SYSTEM; NANOSPRING; PSEUDO-MOSFET; SCANNING PROBE MICROSCOPY;

MOSFET DEVICES;

EID: 33645515363 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.45.2009 Document Type: Article

Times cited : (8)

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