Optical measurement and fabrication from a Morpho-butterfly-scale quasistructure by focused ion beam chemical vapor deposition

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 2, 2005, Pages 570-574

  Watanabe, Keiichiro ^a,b   Hoshino, Takayuki ^b,c   Kanda, Kazuhiro ^a,b   Haruyama, Yuichi ^a,b   Kaito, Takashi ^d   Matsui, Shinji ^a,b  

^a UNIVERSITY OF HYOGO   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^c UNIVERSITY OF TOKYO   (Japan)

^d SII NANOTECHNOLOGY INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

MICROELECTRONICS; NANOSTRUCTURED MATERIALS; OPTICAL MICROSCOPY; REFLECTION; VACUUM;

ION BEAM CHEMICAL VAPOR DEPOSITION; PHOTONIC MULTICHANNEL SPECTRAL ANALYZERS;

CHEMICAL VAPOR DEPOSITION;

EID: 31144474821     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1868697     Document Type: Conference Paper

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