Reconfigurable shadow mask technology: A microsystem for metal nanoline deposition

Nanotechnology

Volumn 15, Issue 10, 2004, Pages

  Courcimault, Christophe G ^a   Allen, Mark G ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRON BEAM LITHOGRAPHY; MICROACTUATORS; MULTILAYERS; PHOTOLITHOGRAPHY; PHYSICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SUBSTRATES;

METAL NANOLINE DEPOSITION; MICROSYSTEMS; NANOSCALE STRUCTURES; SHADOW MASK TECHNOLOGY;

MASKS;

EID: 7044265026     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/15/10/006     Document Type: Conference Paper

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