Nanofabrication using nanotranslated stencil masks and lift off

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 1, 2004, Pages 74-76

  Racz, Zoltan ^a   He, Jianli ^a   Srinivasan, Srivatsan ^a   Zhao, Wei ^a   Seabaugh, Alan ^a   Han, Keping ^b   Ruchhoeft, Paul ^b   Wolfe, Jack ^b  

^a University of Notre Dame   (United States)

^b UNIVERSITY OF HOUSTON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BIMETALS; CANTILEVER BEAMS; ELECTRON TUNNELING; ETCHING; EVAPORATION; MASKS; METALLIZING; NANOSTRUCTURED MATERIALS; OPTICAL COLLIMATORS; PIEZOELECTRIC DEVICES; SURFACE ROUGHNESS; TRANSISTORS;

NANOMECHANICAL SWITCHES; NANOMETER-SCALE METAL FEATURES;

NANOTECHNOLOGY;

EID: 1642324085     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1637916     Document Type: Conference Paper

References (3)

1. J. Kohler, M. Albrecht, C. R. Musil, and E. Bucher, Physica E (Amsterdam) 4, 196 (1999).
2. M. M. Deshmukh, D. C. Ralph, M. Thomas, and J. Silcox, Appl. Phys. Lett. 75, 1631 (1999).
3. G. A. Frazier and A. C. Seabaugh, U.S. Patent No. 6,495,905 (17 December 2002).