Etch damage evaluation in integrated ferroelectric capacitor side wall by piezoresponse force microscopy

Chinese Physics Letters

Volumn 25, Issue 9, 2008, Pages 3489-3492

  Wang, Long Hai ^a   Dai, Ying ^b   Deng, Zhao ^b  

^a WUHAN INSTITUTE OF TECHNOLOGY   (China)

^b WUHAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

FERROELECTRIC MATERIALS; FERROELECTRICITY; IRON COMPOUNDS; NANOTECHNOLOGY;

DAMAGE EVALUATION; DISCRETE DOMAINS; ETCH DAMAGE; EXTERNAL VOLTAGES; INTEGRATED FERROELECTRIC CAPACITORS; NANOSCALE DOMAIN; PIEZORESPONSE; PIEZORESPONSE FORCE MICROSCOPY; SIDE WALLS; THIN-FILMS;

SCANNING PROBE MICROSCOPY;

EID: 56349161618     PISSN: 0256307X     EISSN: 17413540     Source Type: Journal    
DOI: 10.1088/0256-307X/25/9/106     Document Type: Article

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