Reduction of etching damage in lead-zirconate-titanate thin films with inductively coupled plasma

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 4, 2003, Pages 1563-1567

  Lim, Kyu Tae ^a   Kim, Kyoung Tae ^a   Kim, Dong Pyo ^a   Kim, Chang Il ^a  

^a Chung Ang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; FERROELECTRIC MATERIALS; GASES; INDUCTIVELY COUPLED PLASMA; LEAKAGE CURRENTS; MIXING; PLASMA ETCHING; SEMICONDUCTING LEAD COMPOUNDS; SEMICONDUCTOR PLASMAS; X RAY DIFFRACTION ANALYSIS;

LEAD ZIRCONATE TITANATE THIN FILMS; SWITCHING POLARIZATION;

THIN FILMS;

EID: 0042029587     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1568743     Document Type: Article

References (15)

1. C. W. Chung, J. Vac. Sci. Technol. B 16, 1894 (1998).
2. Y. H. Im, J. S. Park, R. J. Choi, G. Y. Yeom, and C. S. Choi, J. Korean Phys. Soc. 39, S503 (2001).
3. D. P. Kim and C. I. Kim, J. Korean Phys. Soc. 39, 189 (2001).
4. D. Ricinschi, A. I. Lerescu, I. Mitoseriu, V. Tura, and M. Okuyama, J. Korean Phys. Soc. 35, S1313 (1999).
5. J. K. Jung and W. J. Lee, Jpn. J. Appl. Phys., Part 1 40, 1408 (2001).
6. W. Pan, C. L. Thio. and S. B. Desu, J. Mater. Res. 13, 362 (1998).
7. W. J. Lee, C. R. Cho, S. H. Kim, I. K. You, and B. W. Kim, Jpn. J. Appl. Phys., Part 2 38, L1428 (1999).
8. N. A. Basit and H. K. Kim, J. Vac. Sci. Technol. A 13, 2214 (1995).
9. M. G. Kang, K. T. Kim, and C. I. Kim, Thin Solid Films 398-399, 448 (2001).
10. S. M. Cho and D. Y. Jeon, Thin Solid Films 338, 151 (1999).
11. S. Tripathy, A. Raman, S. J. Chua, J. S. Pan, and A. Huan, J. Vac. Sci. Technol. A 19, 2522 (2001).
12. S. A. Mansour, G. L. Liedl, and R. W. Vest, J. Am. Ceram. Soc. 78, 1617 (1991).
13. N. Tohge, S. Takahashi, and T. Minami, J. Am. Ceram. Soc. 74, 67 (1991).
14. Y. Y. Lin, Q. Liu, T. A. Tang, and X. Yao, Appl. Surf. Sci. 165, 34 (2000).
15. J. W. Kim, Y. C. Kim, and W. J. Lee, J. Appl. Phys. 78, 2045 (1995).