Thickness dependence of sensor response for CO gas sensing by tin oxide films grown using atomic layer deposition

Sensors and Actuators, B: Chemical

Volumn 135, Issue 1, 2008, Pages 152-160

  Du, X ^a   George, S M ^a,b  

^a UCB 450   (United States)

^b UNIVERSITY OF COLORADO   (United States)

Author keywords

Atomic layer deposition; CO gas sensors; Debye length; Responsivity; Tin oxide

Indexed keywords

ATOMIC PHYSICS; ATOMS; CHEMICAL SENSORS; CHEMISORPTION; GAS DETECTORS; GAS SENSING ELECTRODES; GASES; MAGNETIC FILMS; OXIDE FILMS; PHYSICAL VAPOR DEPOSITION; PULSED LASER DEPOSITION; SENSORS; TIN; TITANIUM COMPOUNDS; ULTRATHIN FILMS;

ATOMIC LAYER DEPOSITION (ALD; ATOMIC LAYERS; CO CHEMISORPTIONS; CO GAS SENSORS; DEBYE LENGTH; DEBYE LENGTHS; ELECTRODE GAPS; GAS SENSORS; HIGHER TEMPERATURES; OF SENSORS; RESPONSE TIMES; RESPONSIVITY; TEMPERATURE DEPENDENTS; THICKNESS DEPENDENCES; TIN OXIDE FILMS;

ATOMIC LAYER DEPOSITION;

EID: 56049103747     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.snb.2008.08.015     Document Type: Article

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