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Advanced Materials

Volumn 20, Issue 7, 2008, Pages 1303-1309

Calix[4]resorcinarene derivatives as high-resolution resist materials for supercritical CO2 processing

(3) Felix, Nelson M a De Silva, Anuja b Ober, Christopher K a

a Cornell University (United States)

b Department of Obstetrics Gynecology (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DISSOLUTION; MAGNESIUM PRINTING PLATES; PHENOLIC RESINS; PHOTORESISTORS;

APPLICATIONS.; BRIDGING PHENYLS; CALIX[4]RESORCINARENE; CALIXARENE; CROSS-LINKER; HIGH-RESOLUTION; HIGH-TEMPERATURE; HYDROXYSTYRENE; NEGATIVE TONES; NOVOLAC; PARA POSITIONS; PATTERNING; RESIST MATERIALS; RESORCINARENE; STRUCTURAL SIMILARITIES; SUPERCRITICAL CO; THERMAL PROPERTIES;

THERMODYNAMIC PROPERTIES;

EID: 54949112459 PISSN: 09359648 EISSN: None Source Type: Journal
DOI: 10.1002/adma.200702772 Document Type: Article

Times cited : (25)

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