Stochastic simulation studies of molecular resists

Microelectronic Engineering

Volumn 84, Issue 5-8, 2007, Pages 1062-1065

  Drygiannakis, D ^a   Patsis, G P ^a   Raptis, I ^a   Niakoula, D ^a   Vidali, V ^b   Couladouros, E ^b   Argitis, P ^a   Gogolides, E ^a  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

^b INSTITUTE OF NANOSCIENCE AND NANOTECHNOLOGY   (Greece)

Author keywords

High resolution lithography; LER; Molecular resists

Indexed keywords

LITHOGRAPHY; MOLECULAR DYNAMICS; OPTICAL RESOLVING POWER; STOCHASTIC MODELS; TWO DIMENSIONAL;

HIGH RESOLUTION LITHOGRAPHY; LINE EDGE ROUGHNESS (LER); MOLECULAR GEOMETRY; MOLECULAR RESISTS;

MOLECULAR WEIGHT;

EID: 34247842869     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.044     Document Type: Article

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