Low-surface-energy fluoromethacrylate block copolymers with patternable elements

Chemistry of Materials

Volumn 12, Issue 1, 2000, Pages 33-40

  Yang, Shu ^a   Wang, Jianguo ^a,b   Ogino, Kenji ^a,c   Valiyaveettil, Suresh ^a,d   Ober, Christopher K ^a  

^a Cornell University   (United States)

^b Corning Incorporated ^*  (United States)

^c TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY   (Japan)

^d NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

COPOLYMER; FLUORINE DERIVATIVE; POLYMETHACRYLIC ACID DERIVATIVE; TETRAHYDROPYRAN DERIVATIVE;

ARTICLE; CHEMICAL ANALYSIS; CHEMICAL STRUCTURE; CROSS LINKING; POLYMERIZATION; SURFACE PROPERTY; SYNTHESIS;

EID: 0033798543     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm990241+     Document Type: Article

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