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Volumn 39, Issue 5, 2008, Pages 661-672
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Theory and experiment of large numerical aperture objective Raman microscopy: Application to the stress-tensor determination in strained cubic materials
b
HORIBA LTD
(Japan)
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Author keywords
Numerical aperture; Raman microscopy; Semiconductor; Stress
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Indexed keywords
MICROELECTRONICS;
SILICON ON INSULATOR TECHNOLOGY;
CHARACTERIZATION TECHNIQUES;
CUBIC MATERIALS;
MICRO-RAMAN;
NUMERICAL APERTURE;
OPTICAL PHONON PEAK;
RAMAN BACKSCATTERING;
RAMAN MICROSCOPY;
SEMICONDUCTOR STRUCTURE;
STRESS SENSITIVE;
STRESS TENSORS;
STRESS TENSOR;
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EID: 51549098260
PISSN: 03770486
EISSN: 10974555
Source Type: Journal
DOI: 10.1002/jrs.1911 Document Type: Article |
Times cited : (26)
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References (28)
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