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Volumn 30, Issue 10, 1999, Pages 885-891
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Spatially resolved stress analysis using raman spectroscopy
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Author keywords
[No Author keywords available]
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Indexed keywords
FINITE ELEMENT METHOD;
LASER BEAMS;
SEMICONDUCTOR QUANTUM WIRES;
SI-GE ALLOYS;
SILICON COMPOUNDS;
SPECTRUM ANALYSIS;
STRESS ANALYSIS;
ELECTRONIC DEVICE STRUCTURES;
FOCUSED LASER BEAMS;
HIGH SPATIAL RESOLUTION;
LASER MICROPROBE;
MICRO-ELECTRONIC DEVICES;
MICRO-RAMAN;
NANOMETRES;
SPATIALLY RESOLVED;
STRESSES ANALYSIS;
STRESSES DISTRIBUTION;
RAMAN SPECTROSCOPY;
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EID: 0001404276
PISSN: 03770486
EISSN: None
Source Type: Journal
DOI: 10.1002/(sici)1097-4555(199910)30:10<885::aid-jrs485>3.3.co;2-x Document Type: Article |
Times cited : (81)
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References (23)
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