Synthesis and characterization of hyperbranched polymers with increased chemical versatility for imprint lithographic resists

Journal of Polymer Science, Part A: Polymer Chemistry

Volumn 46, Issue 18, 2008, Pages 6238-6254

  Khan, Anzar ^a   Malkoch, Michael ^a,b   Montague, Martha F ^c,d   Hawker, Craig J ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^c University of Wisconsin Madison   (United States)

^d IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

Hyperbranched; Imprint lithography; Living radical polymerization; Photopolymerization; Resists

Indexed keywords

HYPERBRANCHED; IMPRINT LITHOGRAPHY; LIVING RADICAL POLYMERIZATION; PHOTOPOLYMERIZATION; RESISTS;

ABS RESINS; BOILING POINT; CHEMICAL PROPERTIES; CROSSLINKING; MATERIALS PROPERTIES; MONOMERS; NANOIMPRINT LITHOGRAPHY; POLYMERS; SUPRAMOLECULAR CHEMISTRY; SYNTHESIS (CHEMICAL);

POLYMER BLENDS;

EID: 51449088227     PISSN: 0887624X     EISSN: 10990518     Source Type: Journal    
DOI: 10.1002/pola.22934     Document Type: Article

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