Novel alignment system for imprint lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 3552-3556

  White, D L ^a   Wood II, O R ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTUATORS; FINITE ELEMENT METHOD; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; PIEZOELECTRIC DEVICES;

IMPRINT LITHOGRAPHY; PIEZOELECTRIC ACTUATORS;

LITHOGRAPHY;

EID: 0034318655     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1319706     Document Type: Article

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