메뉴 건너뛰기




Volumn , Issue , 2008, Pages 160-165

New Y-function-based methodology for accurate extraction of electrical parameters on nano-scaled MOSFETs

Author keywords

CMOS; Compact model; Electrical parameters; Low field drain current; MOSFET; Y function

Indexed keywords

CMOS; COMPACT MODEL; ELECTRICAL PARAMETERS; LOW FIELD DRAIN CURRENT; MOSFET; Y-FUNCTION;

EID: 51349147118     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICMTS.2008.4509332     Document Type: Conference Paper
Times cited : (61)

References (21)
  • 1
    • 0023998758 scopus 로고
    • New method for the extraction of MOSFET parameters
    • Apr
    • G. Ghibaudo. "New method for the extraction of MOSFET parameters," IEE Electronics Letters, vol. 24, pp. 543-545, Apr. 1988.
    • (1988) IEE Electronics Letters , vol.24 , pp. 543-545
    • Ghibaudo, G.1
  • 3
    • 21244453121 scopus 로고    scopus 로고
    • Novel extraction method for size-dependent mobility based on BSIM3-like compact model
    • T. Tanaka, "Novel extraction method for size-dependent mobility based on BSIM3-like compact model." Japanese Journal of Applied Physics, vol. 44, pp. 2424-2427, 2005.
    • (2005) Japanese Journal of Applied Physics , vol.44 , pp. 2424-2427
    • Tanaka, T.1
  • 4
    • 34548821243 scopus 로고    scopus 로고
    • Novel parameter extraction method for low field drain current of nano-scaled MOSFETs
    • Tokyo. Japan, Mar
    • T. Tanaka, "Novel parameter extraction method for low field drain current of nano-scaled MOSFETs," in Proc. IEEE Int. Conf. Microelectronic Test Structures (ICMTS'07), Tokyo. Japan, Mar. 2007. pp. 265-267.
    • (2007) Proc. IEEE Int. Conf. Microelectronic Test Structures (ICMTS'07) , pp. 265-267
    • Tanaka, T.1
  • 5
    • 0026869985 scopus 로고
    • A new 'shift and ratio' method for MOSFET channel-length extraction
    • May
    • Y. Taur, D. Zicherman, D. Lombardi et al., "A new 'shift and ratio' method for MOSFET channel-length extraction," IEEE Electron Device Lett., vol. 13, pp. 267-269, May 1992.
    • (1992) IEEE Electron Device Lett , vol.13 , pp. 267-269
    • Taur, Y.1    Zicherman, D.2    Lombardi, D.3
  • 6
    • 0031233839 scopus 로고    scopus 로고
    • Device parameter extraction in the linear region of MOSFET's
    • Sep
    • H. Katto, "Device parameter extraction in the linear region of MOSFET's," IEEE Trans. Electron Devices, vol. 18, pp. 408-410, Sep. 1997.
    • (1997) IEEE Trans. Electron Devices , vol.18 , pp. 408-410
    • Katto, H.1
  • 7
    • 0035942615 scopus 로고    scopus 로고
    • New ratio method for effective channel length and threshold voltage extraction in MOS transistors
    • May
    • B. Cretu, T. Boutchacha, G. Ghibaudo et al., "New ratio method for effective channel length and threshold voltage extraction in MOS transistors," IEEE Electron Device Lett., vol. 37, pp. 717-719, May 2001.
    • (2001) IEEE Electron Device Lett , vol.37 , pp. 717-719
    • Cretu, B.1    Boutchacha, T.2    Ghibaudo, G.3
  • 8
    • 0030683782 scopus 로고    scopus 로고
    • New approach for the extraction of gate voltage dependent series resistance and channel length reduction in CMOS transistors
    • Monterey, USA. Mar
    • H. Brut, A. Juge, and G. Ghibaudo, "New approach for the extraction of gate voltage dependent series resistance and channel length reduction in CMOS transistors," in Proc. IEEE Int. Conf. Microelectronic Test Structures (ICMTS'97), Monterey, USA. Mar. 1997, pp. 188-193.
    • (1997) Proc. IEEE Int. Conf. Microelectronic Test Structures (ICMTS'97) , pp. 188-193
    • Brut, H.1    Juge, A.2    Ghibaudo, G.3
  • 9
    • 0033877179 scopus 로고    scopus 로고
    • e f f extraction techniques for MOS transistors with halo or pocket implants
    • Mar
    • e f f extraction techniques for MOS transistors with halo or pocket implants," IEEE Trans. Electron Devices, vol. 21, pp. 133-136, Mar. 2000.
    • (2000) IEEE Trans. Electron Devices , vol.21 , pp. 133-136
    • van Meer, H.1    Henson, K.2    Lyu, J.-H.3
  • 10
    • 14844320545 scopus 로고    scopus 로고
    • Characterization of the effective mobility by split C(V) technique in sub 0.1/μm Si and SiGe PMOSFETs
    • K. Romanjek, F. Andrieu, T. Ernst et al., "Characterization of the effective mobility by split C(V) technique in sub 0.1/μm Si and SiGe PMOSFETs," Solid State Electronics, vol. 49, pp. 721-726, 2005.
    • (2005) Solid State Electronics , vol.49 , pp. 721-726
    • Romanjek, K.1    Andrieu, F.2    Ernst, T.3
  • 11
    • 27144453403 scopus 로고    scopus 로고
    • In-depth characterization of the hole mobility in 50-nm process-induced strained MOSFETs
    • Oct
    • F. Andrieu, T. Ernst, C. Ravit et al., "In-depth characterization of the hole mobility in 50-nm process-induced strained MOSFETs," IEEE Electron Device Lett., vol. 26, pp. 755-757, Oct. 2005.
    • (2005) IEEE Electron Device Lett , vol.26 , pp. 755-757
    • Andrieu, F.1    Ernst, T.2    Ravit, C.3
  • 12
    • 46049114538 scopus 로고    scopus 로고
    • Unexpected mobility degradation for very short devices : A new challenge for CMOS scaling
    • San Francisco, USA, Dec
    • A. Cros, K. Romanjek, D. Fleury et al, "Unexpected mobility degradation for very short devices : A new challenge for CMOS scaling," in Proc. IEEE IEDM Tech. Dig., San Francisco, USA, Dec. 2006, pp. 663-666.
    • (2006) Proc. IEEE IEDM Tech. Dig , pp. 663-666
    • Cros, A.1    Romanjek, K.2    Fleury, D.3
  • 13
    • 0031078092 scopus 로고    scopus 로고
    • A physical and scalable 1-V model in BSIM3v3 for analog/digital circuit simulation
    • Feb
    • Y. Cheng, M.-C. Jeng, S. Liu et al., "A physical and scalable 1-V model in BSIM3v3 for analog/digital circuit simulation." IEEE Trans. Electron Devices, vol. 44, pp. 277-287, Feb. 1997.
    • (1997) IEEE Trans. Electron Devices , vol.44 , pp. 277-287
    • Cheng, Y.1    Jeng, M.-C.2    Liu, S.3
  • 14
    • 0023435529 scopus 로고
    • 50-a gate-oxide MOSFETs at 77 k
    • Oct
    • T.-C. Ong, P. K. Ko, and C. Hu, "50-a gate-oxide MOSFETs at 77 k," IEEE Trans. Electron Devices, vol. 34, pp. 2129-2135, Oct. 1987.
    • (1987) IEEE Trans. Electron Devices , vol.34 , pp. 2129-2135
    • Ong, T.-C.1    Ko, P.K.2    Hu, C.3
  • 15
    • 0030244412 scopus 로고    scopus 로고
    • Relationship between empirical and theoritical mobility models in silicon inversion layers
    • Sep
    • G. Reichert and T. Ouisse, "Relationship between empirical and theoritical mobility models in silicon inversion layers," IEEE Trans. Electron Devices, vol. 43, pp. 1394-1398, Sep. 1996.
    • (1996) IEEE Trans. Electron Devices , vol.43 , pp. 1394-1398
    • Reichert, G.1    Ouisse, T.2
  • 16
    • 0028747841 scopus 로고
    • On the universality of inversion layer mobility in si MOSFET's: Part 1 - effects of substrate impurity concentration
    • Dec
    • S. Takagi, "On the universality of inversion layer mobility in si MOSFET's: Part 1 - effects of substrate impurity concentration," IEEE Trans. Electron Devices, vol. 41, pp. 2357-2362, Dec. 1994.
    • (1994) IEEE Trans. Electron Devices , vol.41 , pp. 2357-2362
    • Takagi, S.1
  • 17
    • 0028495320 scopus 로고
    • On the high electric field mobility behavior in Si MOSFET's from room to liquid helium temperature
    • K. Rais, "On the high electric field mobility behavior in Si MOSFET's from room to liquid helium temperature," Physica Status Solidi (a), vol. 145, pp. 217-221, 1994.
    • (1994) Physica Status Solidi (a) , vol.145 , pp. 217-221
    • Rais, K.1
  • 18
    • 0024663692 scopus 로고
    • Analytical modeling of the MOS transistor
    • G. Ghibaudo, "Analytical modeling of the MOS transistor," Physics Stares Solid (a), vol. 113, p. 223, 1989.
    • (1989) Physics Stares Solid (a) , vol.113 , pp. 223
    • Ghibaudo, G.1
  • 20
    • 27644452547 scopus 로고    scopus 로고
    • New extraction method for gate bias dependent series resistance in nanometric double gate transistors
    • Leuven, Belgium, Apr
    • A. Cros, S. Harrison, R. Cerutti et al., "New extraction method for gate bias dependent series resistance in nanometric double gate transistors," in Proc. IEEE Int. Conf. Microelectronic Test Structures (ICMTS'05), Leuven, Belgium, Apr. 2005, pp. 69-74.
    • (2005) Proc. IEEE Int. Conf. Microelectronic Test Structures (ICMTS'05) , pp. 69-74
    • Cros, A.1    Harrison, S.2    Cerutti, R.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.